Recently, the EL EDETM330 high-density plasma ICP etching machine developed by Northern Microelectronics has been assembled and debugged and officially delivered to customers. ELED ETM330 is a successful expansion of the northern microelectronic semiconductor etching technology in the LED field. The successful launch of this device marks that the domestic LED etching equipment has been recognized by the mainstream production line, and the localization level of China's high-end LED equipment has been new. Upgrade.
North Microelectronics has been committed to the research and development and manufacture of high-end semiconductor process equipment for many years. In 2009, Northern Microelectronics developed an inductively coupled high-density plasma etching machine designed specifically for etching applications in the LED production field with the accumulated experience in the field of semiconductor etching equipment. As the first large-capacity etching equipment directly in China for LED production lines, ELEDE?330 can meet all etching applications in LED fields such as sapphire substrate pattern etching, Si substrate etching and GaN-based epitaxial layer etching. ELEDE?330 uses a high-capacity design suitable for large-scale production, can complete 27 2-inch GaN-based epitaxial layer etching or 22 2-inch sapphire substrate etching at one time, greatly improving equipment output efficiency; system integration is high Density plasma source, high-life mechanical chuck, precision chamber temperature control system, stable high-precision pressure control system, IC-standard central nozzle air intake system and IC-level chamber surface treatment, etc. The more precise design requirements of the IC etch process are required to achieve a higher performance etch process in the LED field to increase the luminescence efficiency of the LED chip to a greater extent.
Although there is a strong background of state-owned enterprises, North Microelectronics is steadily on the road of marketization. According to reports, the North Microelectronics IC etch is undergoing research and development of 32nm technology, striving to catch up with the world. At the same time, relying on the accumulation of technology over the years, Northern Microelectronics actively develops products in addition to marketization in the field of PV and LED etching, allowing the industry to feel the charm of international technology and localized prices and services.
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